The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 30, 2012

Filed:

Aug. 03, 2010
Applicants:

Jean-pierre Desbiolles, Cruseilles, FR;

Michel Puech, Metz-Tessy, FR;

Inventors:

Jean-Pierre Desbiolles, Cruseilles, FR;

Michel Puech, Metz-Tessy, FR;

Assignee:

Alcatel, Paris, FR;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
F04F 3/00 (2006.01); F04B 23/08 (2006.01); F04B 49/03 (2006.01); F04B 49/08 (2006.01);
U.S. Cl.
CPC ...
Abstract

Apparatus for establishing and controlling a low pressure gas mixture in a vacuum enclosure () comprises at least one secondary pump () of the molecular, turbomolecular, or hybrid type, followed by at least one primary pump (), with first control and adjustment means () such as a regulation valve () for controlling and adjusting the total gas pressure of the mixture of gases in the vacuum enclosure () as a function of a total pressure setpoint (). The apparatus further comprises second control and adjustment means () such as a second regulation valve () downstream from the secondary pump (). The second regulation valve () is controlled as a function of a delivery pressure setpoint () to modify the delivery pressure of the secondary pump () and thus to adapt its pumping capacity in selective manner. This makes it possible to adjust the proportions of the gases in the mixture of gases in the vacuum enclosure, independently of the total pressure which is controlled by the first regulation valve ().


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