The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 30, 2012
Filed:
Feb. 02, 2009
Nobuo Ishimaru, Takaoka, JP;
Nobuo Ishimaru, Takaoka, JP;
Hitachi Kokusai Electric Inc., Tokyo, JP;
Abstract
An ALD apparatus includes: a process chamber that accommodates a boat charged with a plurality of wafers; gas supply systems that supplies process gases to the wafers; a pair of electrodes arranged in a stacked direction of the wafers; a high-frequency power source that supplies a high-frequency power to the pair of the electrodes; a variable impedance element connected to a front end opposite to the high-frequency power of the pair of the electrodes; and a control unit that changes an output frequency of the high-frequency power source. By moving the local minimum point of the voltage distribution through the change of the output frequency of the high-frequency power source during the plasma discharge, the plasma generation amount within a pair of discharge electrodes is uniformized. Thus, the processing non-uniformity between the wafers stacked in the boat is suppressed, and the processing is uniformized over the total boat length.