The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 23, 2012
Filed:
Nov. 11, 2005
Katsushi Nakano, Kumagaya, JP;
Katsushi Nakano, Kumagaya, JP;
Nikon Corporation, Tokyo, JP;
Abstract
An exposure method for exposing a substrate with exposure light that irradiates the substrate via a liquid, wherein the concentration of an eluted substance in the liquid on the substrate is set so as to satisfy the condition R−R≦1.0×10when Ris the transmittance of the liquid containing an eluted substance eluted from the substrate per 1 mm in the optical path direction of the exposure light, and Ris the transmittance of the liquid that does not contain the eluted substance per 1 mm in the optical path direction of the exposure light.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile