The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 23, 2012
Filed:
Mar. 06, 2008
Applicants:
Hideo Tanaka, Okayama, JP;
Manabu Kuroboshi, Okayama, JP;
Syoichi Tateyama, Okayama, JP;
Takae Yamada, Tokushima, JP;
Yutaka Kameyama, Osaka, JP;
Inventors:
Hideo Tanaka, Okayama, JP;
Manabu Kuroboshi, Okayama, JP;
Syoichi Tateyama, Okayama, JP;
Takae Yamada, Tokushima, JP;
Yutaka Kameyama, Osaka, JP;
Assignee:
Otsuka Chemical Co., Ltd., Osaka-Shi, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C07D 499/04 (2006.01); C07D 499/861 (2006.01);
U.S. Cl.
CPC ...
Abstract
The present invention provides a method by which a 6-hydroxyethyl penam compound represented by General Formula (2) below can be produced with a high selectivity: wherein R represents a hydrogen atom or a protective group for carboxylic acid and Xrepresents a halogen atom; wherein R and Xare the same as above, and Xrepresents a halogen atom;