The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 23, 2012
Filed:
Jun. 15, 2007
Takashi Ito, Yokohama, JP;
Tsuneo Hagiwara, Yokohama, JP;
Kenji Hirotsu, Ube, JP;
Tadashi Murakami, Ube, JP;
Takashi Ito, Yokohama, JP;
Tsuneo Hagiwara, Yokohama, JP;
Kenji Hirotsu, Ube, JP;
Tadashi Murakami, Ube, JP;
CMET Inc., Yokohama-Shi, Kanagawa, JP;
Ube Industries, Ltd., Ube-Shi, Yamaguchi, JP;
Abstract
Provided is a resin composition for stereolithography that absorbs little water and moisture over time in uncured state, maintains a low moisture absorption rate even under high humidity, and has high curing sensitivity, from which a stereolithography product excellent in the properties, such as dimensional accuracy, mechanical properties, and dimensional stability can be smoothly produced for reduced light irradiation time. The resin composition for stereolithography comprising an oxetane compound expressed by the general formula (I) below: wherein Rdenotes an alkyl group having 1 to 5 carbon atoms, and Rdenotes an alkylene group having 2 to 10 carbon atoms that may contain an ether bond, in the proportion of from 3 to 60 mass % based on the total mass of the resin composition for stereolithography.