The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 23, 2012
Filed:
Jun. 15, 2011
Koichi Kajiyama, Yokohama, JP;
Michinobu Mizumura, Yokohama, JP;
Kazushige Hashimoto, Yokohama, JP;
V Technology Co., Ltd., Yokohama-shi, JP;
Abstract
The present invention is a photomaskfor exposing a substrate coated with a positive photosensitive material. At least a first mask pattern groupand a second mask pattern groupare formed on a transparent substrate at a predetermined arrangement pitch. The first mask pattern grouphas first light shielding patternsarranged at an interval corresponding to two types of convex pattern forming portions of different heights on the substrate, in which the first light shielding patternseach have a substantially same area as a cross sectional area of a convex pattern. The second mask pattern grouphas a second light shielding patternand an opening pattern, in which the second light shielding patternhas a predetermined area and corresponds to a higher convex pattern forming portion among the two types of convex pattern forming portions, and the opening pattern corresponds to a lower convex pattern forming portion. This enables top parts of a plurality of types of convex patterns of different heights to be shaped substantially hemispherical.