The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 23, 2012

Filed:

Mar. 17, 2008
Applicants:

Nagesh Ramachandra, Balmain, AU;

Jennifer Mia Fishburn, Balmain, AU;

Paul Timothy Sharp, Balmain, AU;

Susan Williams, Balmain, AU;

Paul Andrew Papworth, Balmain, AU;

Simon Fielder, Balmain, AU;

Kia Silverbrook, Balmain, AU;

Inventors:

Nagesh Ramachandra, Balmain, AU;

Jennifer Mia Fishburn, Balmain, AU;

Paul Timothy Sharp, Balmain, AU;

Susan Williams, Balmain, AU;

Paul Andrew Papworth, Balmain, AU;

Simon Fielder, Balmain, AU;

Kia Silverbrook, Balmain, AU;

Assignee:

Zamtec Limited, Dublin, IE;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B32B 38/00 (2006.01); B32B 38/04 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method of fabricating an apertured polymeric film. The method comprising the steps of: (a) masking a polymeric film with a first mask having first laser transmission zones defined therein; (b) laser-ablating first apertures through the polymeric film using the first mask; (c) masking the film with a second mask having second laser transmission zones defined therein, each second zone being aligned with a corresponding first aperture, and each second zone having greater perimeter dimensions than the corresponding first aperture; and (d) reaming the first apertures by laser-ablating the polymeric film using the second mask, the reamed first apertures defining second apertures in the film.


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