The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 23, 2012

Filed:

Nov. 24, 2008
Applicants:

Jeffrey E. Leclaire, Boca Raton, FL (US);

Kenneth G. Roessler, Boca Raton, FL (US);

David Brinkley, Baltimore, MD (US);

Inventors:

Jeffrey E. LeClaire, Boca Raton, FL (US);

Kenneth G. Roessler, Boca Raton, FL (US);

David Brinkley, Baltimore, MD (US);

Assignee:

Rave, LLC, Delray Beach, FL (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B08B 7/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

Methods for cleaning a surface of a substrate and for increasing the useable lifetime of a photomask substrate are provided. In one method, a substrate has at least one radiation-produced particle disposed thereon, and a laser that has a wavelength that substantially coincides with a high absorption coefficient of the substrate is directed towards the substrate. A thermal increase is generated in the substrate, and the radiation-produced particle is removed from the substrate by transferring thermal energy from the substrate to the radiation-produced particle until the radiation-produced particle decomposes.


Find Patent Forward Citations

Loading…