The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 16, 2012

Filed:

Mar. 03, 2010
Applicants:

Gary W. Flake, Bellevue, WA (US);

William H. Gates, Iii, Redmond, WA (US);

Alexander G. Gounares, Kirkland, WA (US);

W. Daniel Hillis, Encino, CA (US);

Royce A. Levien, Lexington, MA (US);

Mark A. Malamud, Seattle, WA (US);

Craig J. Mundie, Seattle, WA (US);

Christopher D. Payne, Seattle, WA (US);

Richard F. Rashid, Redmond, WA (US);

Clarence T. Tegreene, Bellevue, WA (US);

Charles Whitmer, North Bend, WA (US);

Lowell L. Wood, Jr., Bellevue, WA (US);

Inventors:

Gary W. Flake, Bellevue, WA (US);

William H. Gates, III, Redmond, WA (US);

Alexander G. Gounares, Kirkland, WA (US);

W. Daniel Hillis, Encino, CA (US);

Royce A. Levien, Lexington, MA (US);

Mark A. Malamud, Seattle, WA (US);

Craig J. Mundie, Seattle, WA (US);

Christopher D. Payne, Seattle, WA (US);

Richard F. Rashid, Redmond, WA (US);

Clarence T. Tegreene, Bellevue, WA (US);

Charles Whitmer, North Bend, WA (US);

Lowell L. Wood, Jr., Bellevue, WA (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 17/30 (2006.01);
U.S. Cl.
CPC ...
Abstract

The present disclosure relates generally to determining influencers in a Web 2.0 environment. More specifically, in some implementations, an influence of an electronically-accessed content on an involvement between an accessor and a third party is determined. In further implementations, a provider of the electronically accessed content is rewarded based on the assessed influence.


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