The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 16, 2012

Filed:

Mar. 14, 2008
Applicants:

Meng H. Lean, Santa Clara, CA (US);

Shu Chang, Pittsford, NY (US);

Daniel L. Larner, San Jose, CA (US);

Armin R. Volkel, Mountain View, CA (US);

Inventors:

Meng H. Lean, Santa Clara, CA (US);

Shu Chang, Pittsford, NY (US);

Daniel L. Larner, San Jose, CA (US);

Armin R. Volkel, Mountain View, CA (US);

Assignees:

Xerox Corporation, Norwalk, CT (US);

Palo Alto Research Center Incorporated, Palo Alto, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03G 15/08 (2006.01); G03G 15/06 (2006.01);
U.S. Cl.
CPC ...
Abstract

An improved method and system for non-contact powder image development are provided. The present technique implements a 5-stage jumping development cycle where the initial stage is a momentary over-voltage condition to release the majority of the toner on a donor substrate and the final stage includes the implementation of a decelerating potential to minimize return impact on the donor and therefore toner abuse. It also uses a routine to directly determine improved (e.g. up to optimal) waveform amplitudes and pulse widths based on toner size and q/m, guided by physical insight.


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