The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 16, 2012
Filed:
Oct. 21, 2010
Sang Kyun Lee, Yongin-si, KR;
Won Jae Joo, Yongin-si, KR;
Kwang Hee Lee, Yongin-si, KR;
Tae Lim Choi, Yongin-si, KR;
Myung Sup Jung, Yongin-si, KR;
Sang Kyun Lee, Yongin-si, KR;
Won Jae Joo, Yongin-si, KR;
Kwang Hee Lee, Yongin-si, KR;
Tae Lim Choi, Yongin-si, KR;
Myung Sup Jung, Yongin-si, KR;
Samsung Electronics Co., Ltd., Gyeonggi-do, KR;
Abstract
Disclosed are a method for forming an organic layer pattern which is characterized by forming a thin layer by coating a coating solution including a polyimide-based polymer having a heteroaromatic pendant group including a heteroatom in its polyimide major chain, a photoinitiator and a crosslinking agent on a substrate and drying the substrate, and exposing and developing the thin layer, an organic layer pattern prepared by the method, and an organic memory device comprising the pattern. According to example embodiments, a high-resolution micropattern may be formed without undergoing any expensive process, e.g., photoresist, leading to simplification of the preparation process and cost reduction.