The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 16, 2012
Filed:
Jul. 27, 2010
Koji Ichikawa, Toyonaka, JP;
Isao Yoshida, Ikeda, JP;
Satoshi Yamaguchi, Kawachinagano, JP;
Sumitomo Chemical Company, Limited, Tokyo, JP;
Abstract
The object of the present invention is to provide a chemically amplified resist composition excellent in a resolution and a mask error enhancement factor. By employing the salt represented by the formulae (A1) as an acid generator of a resist composition, the above mentioned object is achieved. wherein Zrepresents an organic cation, Qand Qeach independently represent a fluorine atom or a perfluoroalkyl group, Rrepresents a divalent alicyclic hydrocarbon group pr the like, Rrepresents an elimination group represented by the formulae (II-1) or (II-2). In the formulae (II-1) or (II-2), Rand Reach independently represent a hydrogen atom or an aliphatic hydrocarbon group, Rrepresents an aliphatic hydrocarbon group, Rrepresents a divalent aliphatic hydrocarbon group, and Rrepresents an aliphatic hydrocarbon group.