The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 16, 2012
Filed:
Jun. 29, 2010
Taro Moriya, Kumamoto, JP;
Taro Moriya, Kumamoto, JP;
Renesas Electronics Corporation, Kanagawa, JP;
Abstract
A reticle includes: a repetition pattern; and a peripheral pattern. One of the repetition pattern and peripheral pattern is a first pattern with a first side in a first direction and the other is a second pattern with a second side in the first direction. The first side has a first length equal to or longer than a second length of the second side. The first length is n (n is an integer equal to or larger than 1) times as large as the second length. The first pattern has at least one of first misalignment measurement patterns provided at positions distant by a third length and ((the third length)+(n−1)×(the second length)) from an upper end of the first pattern. The third length is equal to or smaller than the second length. The second pattern has a second misalignment measurement pattern provided at a position distant by the third length from an upper end of the second pattern.