The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 16, 2012
Filed:
Dec. 22, 2009
Hirokazu Hasegawa, Kyoto, JP;
Mikihito Takenaka, Kyoto, JP;
Hiroshi Yoshida, Mito, JP;
Yasuhiko Tada, Tokai, JP;
Hirokazu Hasegawa, Kyoto, JP;
Mikihito Takenaka, Kyoto, JP;
Hiroshi Yoshida, Mito, JP;
Yasuhiko Tada, Tokai, JP;
Hitachi, Ltd., Tokyo, JP;
Abstract
The present invention provides a method of manufacturing a high-molecular thin film having a fine structure from a block-copolymer compound containing a block copolymer A as a main constituent composed of at least a block chain Aand a block chain A, and a block copolymer B as an accessory constituent composed of a block chain Bmiscible with a polymeric phase Pmainly composed of the block chain Aand a block chain Bmiscible with a polymeric phase Pmainly composed of the block chain A, and a substrate having a surface on which the block-copolymer compound is applied and on which a pattern member formed of a second material is discretely arranged to a surface part formed of a first material.