The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 02, 2012
Filed:
Jul. 21, 2011
Jeffrey Scott, Carpenteria, CA (US);
Michael Zani, Laguna Niguel, CA (US);
Mark Bennahmias, Torrance, CA (US);
Mark Mayse, Dublin, CA (US);
Jeffrey Scott, Carpenteria, CA (US);
Michael Zani, Laguna Niguel, CA (US);
Mark Bennahmias, Torrance, CA (US);
Mark Mayse, Dublin, CA (US);
Nexgen Semi Holding, Inc., Laguna Niguel, CA (US);
Abstract
A manufacturing process technology creates a pattern on a first layer using a focused ion beam process. The pattern is transferred to a second layer, which may act as a traditional etch stop layer. The pattern can be formed on the second layer without irradiation by light through a reticle and without wet chemical developing, thereby enabling conformal coverage and very fine critical feature control. Both dark field patterns and light field patterns are disclosed, which may enable reduced or minimal exposure by the focused ion beam.