The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 02, 2012
Filed:
Nov. 10, 2011
Applicants:
Kevin Krogman, Santa Clara, CA (US);
David Olmeijer, San Francisco, CA (US);
Rajul Shah, Fremont, CA (US);
Benjamin Wang, Mountain View, CA (US);
Inventors:
Kevin Krogman, Santa Clara, CA (US);
David Olmeijer, San Francisco, CA (US);
Rajul Shah, Fremont, CA (US);
Benjamin Wang, Mountain View, CA (US);
Assignee:
Svaya Nanotechnologies, Inc., Sunnyvale, CA (US);
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
B05D 3/02 (2006.01);
U.S. Cl.
CPC ...
Abstract
The invention provides methods for modifying one or more properties of porous thin films. In such methods, a formulation comprising a reactive species is applied to the porous thin film and allowed to crosslink. In some embodiments, the crosslinked network thus formed imparts increased mechanical strength and wear resistance to the porous thin films.