The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 02, 2012
Filed:
Oct. 23, 2008
Changsung Sean Kim, Gyunggi-do, KR;
Chang Hwan Choi, Gyunggi-do, KR;
Jong PA Hong, Gyunggi-do, KR;
Joong El Kim, Gyunggi-do, KR;
Changsung Sean Kim, Gyunggi-do, KR;
Chang Hwan Choi, Gyunggi-do, KR;
Jong Pa Hong, Gyunggi-do, KR;
Joong El Kim, Gyunggi-do, KR;
Samsung Electronics Co., Ltd., Seoul, KR;
Abstract
There is provided a chemical vapor deposition apparatus improved in structure such that a reaction gas introduced into a reactor where deposition is performed flows at a substantially uniform rate to ensure a thin film is grown substantially uniformly on the deposition object. The chemical vapor deposition apparatus includes: a chamber; a reactor provided in the chamber to have a deposition object deposited therein; and a reservoir storing a reaction gas fed from the outside to introduce the reaction gas to the reactor, the reservoir having a cross-sectional area changing according to a flow path of the introduced reaction gas.