The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 25, 2012
Filed:
Dec. 27, 2007
Hyun-jong Chung, Daejeon, KR;
Ran-ju Jung, Suwon-si, KR;
Sun-ae Seo, Hwaseong-si, KR;
Dong-chul Kim, Suwon-si, KR;
Chang-won Lee, Seoul, KR;
Hyun-jong Chung, Daejeon, KR;
Ran-ju Jung, Suwon-si, KR;
Sun-ae Seo, Hwaseong-si, KR;
Dong-chul Kim, Suwon-si, KR;
Chang-won Lee, Seoul, KR;
Samsung Electronics Co., Ltd., Gyeonggi-do, KR;
Abstract
Provided are a field effect transistor, a logic circuit including the same and methods of manufacturing the same. The field effect transistor may include an ambipolar layer that includes a source region, a drain region, and a channel region between the source region and the drain region, wherein the source region, the drain region, and the channel region may be formed in a monolithic structure, a gate electrode on the channel region, and an insulating layer separating the gate electrode from the ambipolar layer, wherein the source region and the drain region have a width greater than that of the channel region in a second direction that crosses a first direction in which the source region and the drain region are connected to each other.