The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 25, 2012
Filed:
Jun. 01, 2010
Kevin A. O'lenick, Dacula, GA (US);
Anthony J. O'lenick, Jr., Dacula, GA (US);
Kevin A. O'Lenick, Dacula, GA (US);
Anthony J. O'Lenick, Jr., Dacula, GA (US);
SurfaTech Corporation, Lawrenceville, GA (US);
Abstract
The present invention relates to a novel class of polymeric compounds having specific quaternized amine based upon a dimer acid reacted with a combination of a monohydroxy functional amine and a specific di-hydroxy functional tertiary alkanolamine, to make an ester tertiary amine, which is a subsequent step is converted to a quaternary compound. Dimer acid is a C-36 diacid having a cyclic structure and reacting it with the two type of amine groups allow for the synthesis of a high molecular weight cationic compound which is extremely substantitive to human skin and are well tolerated by human tissue making them suitable for use preparation of barrier products for personal care applications. These materials are dimethylaminopropyl amine free, which is highly desirable in personal care applications.