The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 25, 2012
Filed:
May. 18, 2010
Yoshitaka Saijo, Tokyo, JP;
Yuichi Suzuki, Tokyo, JP;
Ryoji Akiyama, Tokyo, JP;
Atsuyoshi Takenaka, Tokyo, JP;
Junichiro Kase, Tokyo, JP;
Yoshitaka Saijo, Tokyo, JP;
Yuichi Suzuki, Tokyo, JP;
Ryoji Akiyama, Tokyo, JP;
Atsuyoshi Takenaka, Tokyo, JP;
Junichiro Kase, Tokyo, JP;
Asahi Glass Company, Limited, Tokyo, JP;
Abstract
The invention provides a method for etching which is intended for reducing the thickness of a glass substrate, and which attains a high etching rate and is capable of inhibiting haze generation on the glass substrate surface. The invention relates to a method for etching a glass substrate surface, comprising etching the glass substrate surface in an amount of 1-690 μm in terms of etching amount, in which the etching is conducted with an etchant having an HF concentration of 1-5 wt % and an HCl concentration of 1 wt % or higher.