The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 25, 2012
Filed:
Dec. 13, 2006
Applicants:
Stefan Schneider, Valens, CH;
Marcel Muller, St. Gallen, CH;
Jiri Vyskocil, Praha, CZ;
Israel Wagner, Sargans, CH;
Inventors:
Stefan Schneider, Valens, CH;
Marcel Muller, St. Gallen, CH;
Jiri Vyskocil, Praha, CZ;
Israel Wagner, Sargans, CH;
Assignee:
Oerlikon Solar AG, Trubbach, Trubbach, CH;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C 14/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
An apparatus and method are provided for improved utilization of a sputter target in the longitudinal end regions. The focus of erosion in the end regions is widened, thereby extending the useful life of the target. This provides improved efficiency and reduces waste because a greater proportion of the target material in the more expansive central region can be harvested, because the target is utilized for a longer period of time.