The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 18, 2012
Filed:
Jul. 31, 2008
Shmuel Avidan, Brookline, MA (US);
Jen-chan Chien, Saratoga, CA (US);
Chintan {hacek Over (I)}ntwala, Santa Clara, CA (US);
Shmuel Avidan, Brookline, MA (US);
Jen-Chan Chien, Saratoga, CA (US);
Chintan {hacek over (I)}ntwala, Santa Clara, CA (US);
Adobe Systems Incorporated, San Jose, CA (US);
Abstract
A system and method for expansion and reduction of images uses a hybrid resizing technique combining seam carving and image scaling techniques to reduce or expand an input image. Seam carving techniques may be used to remove or add seams of the image to perform a portion of an overall resizing operation, according to a configurable seam carving tolerance. For example, the technique may only remove and/or replicate a predetermined number or percentage of the lowest-cost seams of the image, or may only remove or replicate the number of low-cost seams needed to achieve a specified percentage of the target resizing operation. The hybrid technique may apply scaling techniques to further resize the image to achieve a target size and/or ratio for the resized image. The hybrid technique may be implemented by program instructions of an image editing application, and the seam carving tolerance may be configurable by a user.