The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 18, 2012

Filed:

Jul. 31, 2008
Applicants:

Shmuel Avidan, Brookline, MA (US);

Jen-chan Chien, Saratoga, CA (US);

Chintan Intwala, Santa Clara, CA (US);

Inventors:

Shmuel Avidan, Brookline, MA (US);

Jen-Chan Chien, Saratoga, CA (US);

Chintan Intwala, Santa Clara, CA (US);

Assignee:

Adobe Systems Incorporated, San Jose, CA (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G06K 9/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A system and method for expansion and reduction of images uses a hybrid resizing technique that combines seam carving and image scaling techniques to reduce or expand an image. Seam carving techniques may be used to remove or add seams having an average or total energy cost below a configurable threshold, where the cost of each seam is dependent on the energy values of the pixels of the seam. If a target size and/or ratio for the resized version of the image is not reached by removing or adding these seams, the hybrid resizing technique may apply standard or custom image scaling techniques to further reduce or expand the image to achieve the target size and/or ratio. The hybrid technique may be implemented by program instructions of an image editing application, and the cost threshold may be configurable by a user through a user interface of the image editing application.


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