The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 18, 2012

Filed:

Dec. 29, 2008
Applicants:

Hironori Araki, Milpitas, CA (US);

Yoshitaka Sasaki, Milpitas, CA (US);

Hiroyuki Ito, Milpitas, CA (US);

Shigeki Tanemura, Milpitas, CA (US);

Kazuo Ishizaki, Milpitas, CA (US);

Takehiro Horinaka, Milpitas, CA (US);

Inventors:

Hironori Araki, Milpitas, CA (US);

Yoshitaka Sasaki, Milpitas, CA (US);

Hiroyuki Ito, Milpitas, CA (US);

Shigeki Tanemura, Milpitas, CA (US);

Kazuo Ishizaki, Milpitas, CA (US);

Takehiro Horinaka, Milpitas, CA (US);

Assignee:

Headway Technologies, Inc., Milipitas, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G11B 5/127 (2006.01);
U.S. Cl.
CPC ...
Abstract

A magnetic head includes a side shield layer and an encasing layer. The side shield layer has a first end face located in the medium facing surface, a second end face opposite to the first end face, and a first groove accommodating a portion of a pole layer. The first end face includes two portions located on both sides of an end face of the pole layer that are opposite to each other in a track width direction. The encasing layer is formed of a nonmagnetic material and disposed on a side of the side shield layer opposite to a medium facing surface. The encasing layer has a front end face touching the second end face of the side shield layer, and a second groove accommodating another portion of the pole layer. The distance from the medium facing surface to an arbitrary point on the second end face of the side shield layer decreases with decreasing distance from the arbitrary point to the top surface of a substrate.


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