The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 18, 2012
Filed:
Sep. 22, 2011
Seiji Kamba, Nagaokakyo, JP;
Takashi Kondo, Nagaokakyo, JP;
Koji Tanaka, Nagaokakyo, JP;
Kazuhiro Takigawa, Nagaokakyo, JP;
Yuichi Ogawa, Sendai, JP;
Seiji Kamba, Nagaokakyo, JP;
Takashi Kondo, Nagaokakyo, JP;
Koji Tanaka, Nagaokakyo, JP;
Kazuhiro Takigawa, Nagaokakyo, JP;
Yuichi Ogawa, Sendai, JP;
Murata Manufacturing Co., Ltd., Nagaokakyo-Shi, Kyoto-fu, JP;
National University Corporation Tohoku University, Sendai-shi, Miyagi, JP;
Abstract
A method of attaching an object to be measured to a structure causing a diffraction phenomenon; irradiating the structure to which the object to be measured is attached and which causes the diffraction phenomenon with an electromagnetic wave; detecting the electromagnetic wave scattered by the structure causing the diffraction phenomenon; and measuring a characteristic of the object to be measured from the frequency characteristic of the detected electromagnetic wave. The object to be measured is attached directly to the surface of the structure causing the diffraction phenomenon. Thus, the method for measuring the characteristic of an object to be measured exhibits an improved measurement sensitivity and high reproducibility. A structure causing a diffraction phenomenon and used for the method, and a measuring device are provided.