The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 18, 2012
Filed:
Mar. 18, 2009
Marco Balucani, Rome, IT;
Marco Balucani, Rome, IT;
Rise Technology S.R.L., Pomezia, IT;
Abstract
A method for making a micro structure () is proposed. The method starts with the step of providing a silicon substrate (), which has a main surface. A porous silicon layer ()—extending into the silicon substrate from the main surface—is then formed. The method continues by etching the porous silicon layer selectively to obtain a set of projecting microelements of porous silicon (); each projecting microelement projects from a remaining portion of the silicon substrate (), thereby exposing a corresponding external surface. The projecting microelements are then treated to obtain a set of corresponding conductive () or insulating (') microelements; each conductive or insulating microelement is obtained by converting at least a prevalent portion of the porous silicon (extending into the corresponding projecting element from the external surface) into porous metal or ceramics, respectively.