The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 18, 2012
Filed:
Jan. 14, 2009
Lin-en Chou, Kao Hsiung Hsien, TW;
Chia-hao Tsai, Taipei Hsien, TW;
Wen-tung Wang, Hsinchu County, TW;
Lin-En Chou, Kao Hsiung Hsien, TW;
Chia-Hao Tsai, Taipei Hsien, TW;
Wen-Tung Wang, Hsinchu County, TW;
Taiwan TFT LCD Association, Hsinchu, TW;
Chunghwa Picture Tubes, Ltd., Taoyuan, TW;
AU Optronics Corp., Hsinchu, TW;
Hannstar Display Corp., Taipei, TW;
Chi Mei Optoelectronics Corp., Tainan County, TW;
Industrial Technology Research Institute, Hsinchu, TW;
Toppoly Optoelectronics Corp., Miao-Li County, TW;
Abstract
A method for producing a thin film transistor includes providing a glass substrate; disposing a positive photosensitive coating on the glass substrate; providing a transparent molding plate having a plurality of ladder opaque protrusions that are arranged in accordance with a predetermined pattern and that have at least two different depths; pressing the transparent molding plate into the positive photosensitive coating without contacting the glass substrate; exposing a part of the positive photosensitive coating which is unshielded under the ladder opaque protrusions, with a UV light; separating the transparent molding plate from the glass substrate after the step of exposing; and removing the part of the positive photosensitive coating, which is unshielded under the ladder opaque protrusions and not cured, using a chemical solvent, whereby the thin film transistor is formed in a pattern having more than two different depths.