The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 18, 2012
Filed:
Mar. 01, 2011
Mary Kathryn Gutberlet, Prunedale, CA (US);
Rambod Nader, Campbell, CA (US);
Michael Andrew Parker, Fremont, CA (US);
Douglas Johnson Werner, Fremont, CA (US);
Mary Kathryn Gutberlet, Prunedale, CA (US);
Rambod Nader, Campbell, CA (US);
Michael Andrew Parker, Fremont, CA (US);
Douglas Johnson Werner, Fremont, CA (US);
Hitachi Global Storage Technologies Netherlands B.V., Amsterdam, NL;
Abstract
A photolithographic mask set for creating a plurality of characters on a device includes a plurality of photolithographic masks, wherein each mask includes at least one mask character area and at least one mask character field area that surrounds said mask character area; wherein each said mask character field area has a radiation energy density transmission factor Tthat is greater than zero, and wherein each mask character area has a radiation energy density transmission factor Tthat is greater than zero, such that each mask character field area and each mask character area of each mask is not opaque.