The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 11, 2012

Filed:

Jan. 22, 2010
Applicants:

Tohru Kiuchi, Tokyo, JP;

Hideo Mizutani, Yokohama, JP;

Inventors:

Tohru Kiuchi, Tokyo, JP;

Hideo Mizutani, Yokohama, JP;

Assignee:

Nikon Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/42 (2006.01); G03B 27/58 (2006.01); G03B 27/32 (2006.01);
U.S. Cl.
CPC ...
Abstract

An exposure apparatus of one aspect of the present invention is provided with a moving mechanism that moves a first portion of a belt-shaped substrate that has photosensitivity in a first heading along a first direction and moves a second portion of the substrate in a second heading along the first direction, a stage mechanism that holds a mask and moves it in a third heading along a second direction in synchronization with the movement of the substrate, and a projection optical system. The projection optical system forms a first projection image of the pattern on the first portion so that the third heading on the mask and the first heading on the first portion optically correspond, and forms a second projection image of the pattern on the second portion so that the third heading on the mask and the second heading on the second portion optically correspond.


Find Patent Forward Citations

Loading…