The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 11, 2012

Filed:

Oct. 16, 2009
Applicants:

Tsu-chiang Chang, Taipei, TW;

Po-yang Chen, Tainan, TW;

Chao-hui Wu, Kaohsiung, TW;

Po-sheng Shih, Xinzhu, TW;

Inventors:

Tsu-Chiang Chang, Taipei, TW;

Po-Yang Chen, Tainan, TW;

Chao-Hui Wu, Kaohsiung, TW;

Po-Sheng Shih, Xinzhu, TW;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02F 1/136 (2006.01); G02F 1/1343 (2006.01);
U.S. Cl.
CPC ...
Abstract

The present invention provides a method for forming a pixel element. The method comprises: forming a first patterned metal layer within the pixel area; forming an insulation layer on the first patterned metal layer; forming a semiconductor layer on the insulation layer; patterning the semiconductor layer to form bend seed generation portion; and forming a second metal layer to connect the semiconductor layer.


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