The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 11, 2012
Filed:
Feb. 02, 2009
Paul E. Debevec, Marina del Rey, CA (US);
Abhijeet Ghosh, Playa del Rey, CA (US);
Paul E. Debevec, Marina del Rey, CA (US);
Abhijeet Ghosh, Playa del Rey, CA (US);
University of Southern California, Los Angeles, CA (US);
Abstract
Techniques are described for modeling layered facial reflectance consisting of specular reflectance, single scattering, and shallow and deep subsurface scattering. Parameters of appropriate reflectance models can be estimated for each of these layers, e.g., from just 20 photographs recorded in a few seconds from a single view-point. Spatially-varying specular reflectance and single-scattering parameters can be extracted from polarization-difference images under spherical and point source illumination. Direct-indirect separation can be employed to decompose the remaining multiple scattering observed under cross-polarization into shallow and deep scattering components to model the light transport through multiple layers of skin. Appropriate diffusion models can be matched to the extracted shallow and deep scattering components for different regions on the face. The techniques were validated by comparing renderings of subjects to reference photographs recorded from novel viewpoints and under novel illumination conditions. Related geometry acquisition systems and software products are also described.