The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 11, 2012
Filed:
Mar. 12, 2007
Norio Tamura, Ichihara, JP;
Norio Tamura, Ichihara, JP;
JNC Corporation, Tokyo, JP;
Chisso Petrochemical Corporation, Tokyo, JP;
Abstract
[Object] To obtain an alignment film having excellent alignment stability of a liquid crystal and a high voltage holding ratio by application of linearly polarized light to a polyamic acid having a specific structure and then imidization under heat. [Solving Means] A photo-alignment film is obtained by: applying a polyamic acid solution on a substrate, where the polyamic acid contains, in its main chain, at least a group having unsaturated groups having 1 to 3 carbon-carbon double bonds or 1 to 4 triple bonds; vaporizing a solvent from a film formed; applying linearly polarized light to the film after the vaporization of the solvent; and then heating the film to imidize the polyamic acid.