The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 11, 2012

Filed:

Jun. 26, 2006
Applicants:

Andreas Klaus Berger, San Jose, CA (US);

Hoa Van DO, Fremont, CA (US);

Eric Edward Fullerton, Morgan Hill, CA (US);

David Thomas Margulies, Los Gatos, CA (US);

Natacha Frederique Supper, Campbell, CA (US);

Inventors:

Andreas Klaus Berger, San Jose, CA (US);

Hoa Van Do, Fremont, CA (US);

Eric Edward Fullerton, Morgan Hill, CA (US);

David Thomas Margulies, Los Gatos, CA (US);

Natacha Frederique Supper, Campbell, CA (US);

Assignee:

HGST Netherlands B.V., Amsterdam, NL;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G11B 5/66 (2006.01);
U.S. Cl.
CPC ...
Abstract

A laminated magnetic recording structure for use in perpendicular or longitudinal recording is described. A small amount of ferromagnetic coupling is added between the two magnetic layers that are sufficiently decoupled to switch independently. In one embodiment the coupling is achieved by doping the spacer layer with a ferromagnetic material. Ruthenium (Ru), which is a preferred nonmagnetic material for spacer layers with cobalt (Co) being the preferred magnetic material. The weak ferromagnetic coupling can also be achieved through the use of platinum, palladium and alloys thereof for the spacer layer without the addition of a ferromagnetic element, but alternatively they can also be doped with ferromagnetic elements. For embodiments for perpendicular recording the spacer layer further can additionally comprise oxides of one or more elements selected from the group consisting of Si, Ta, Ti, Nb, Cr, V and B.


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