The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 11, 2012
Filed:
May. 28, 2009
Pin-chen Chen, Taipei, TW;
Hui-lung Kuo, Taipei, TW;
Chih-ho Chiu, Taipei, TW;
Liang-bin Yu, Taipei County, TW;
Pin-Chen Chen, Taipei, TW;
Hui-Lung Kuo, Taipei, TW;
Chih-Ho Chiu, Taipei, TW;
Liang-Bin Yu, Taipei County, TW;
Industrial Technology Research Institute, Hsinchu, TW;
Abstract
A color filter having a bi-layer metal grating is formed by nanoimprint lithography. Nanoimprint lithography, a low cost technology, includes two alternatives, i.e., hot-embossing nanoimprint lithography and UV-curable nanoimprint lithography. Manufacture steps includes providing a substrate with a polymer material layer disposed thereon. A plurality of lands and grooves are formed in the polymer material layer, and a first metal layer and a second metal layer are disposed on the surfaces of the lands and grooves, respectively. Finally, a color filter having a bi-layer metal grating is obtained.