The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 11, 2012
Filed:
Jan. 30, 2008
Hiroomi Miyahara, Nagasaki, JP;
Tatsuyuki Nishimiya, Nagasaki, JP;
Hiroomi Miyahara, Nagasaki, JP;
Tatsuyuki Nishimiya, Nagasaki, JP;
Mitsubishi Heavy Industries, Ltd., Tokyo, JP;
Abstract
A vacuum treatment method and a vacuum treatment apparatus are provided in which the SiH/SiH ratio does not increase even when the deposition rate is increased, thereby deterioration in the film quality is prevented and a high level of productivity can be achieved. A vacuum treatment method comprising the steps of heating a substrate () disposed inside a deposition chamber () under a reduced pressure atmosphere using a heat spreader (a heating device) (), and supplying electric power to a discharge electrode () disposed in a position facing the substrate (), thereby conducting a deposition on the substrate (), wherein the deposition is conducted in a state where the temperature difference between the substrate () and the discharge electrode () is not more than 30° C. The deposition may also be conducted with the gap between the substrate () and the discharge electrode () set to not more than 7.5 mm.