The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 11, 2012

Filed:

Jun. 16, 2006
Applicants:

Jeffrey T. Koberstein, Storrs, CT (US);

Peng Wang, Ann Arbor, MI (US);

Feng Pan, New York, NY (US);

Inventors:

Jeffrey T. Koberstein, Storrs, CT (US);

Peng Wang, Ann Arbor, MI (US);

Feng Pan, New York, NY (US);

Attorney:
Int. Cl.
CPC ...
B05D 5/00 (2006.01); B05D 3/06 (2006.01); C08J 7/18 (2006.01);
U.S. Cl.
CPC ...
Abstract

The invention is directed to methods for coating monolayer films of surface-active polymers onto substrates of arbitrary shape, and molecular-based methods and processes to control the chemical and physical nature of surfaces and interfaces. The invention is also directed to methods for modifying a surface of a monolayer comprising a) coating a monolayer on a substrate, wherein the monolayer is formed by self-assembly of end-surfactant molecules, thereby positioning a photoactive functional group at the air-monolayer interface; and b) exposing the monolayer to radiation, wherein each organic group of the monolayer contains a first functionality that is not converted to a second functionality upon exposure to acid.


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