The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 11, 2012

Filed:

Jun. 25, 2010
Applicants:

Guanghong Luo, Fremont, CA (US);

Changqing Shi, San Ramon, CA (US);

Danning Yang, Fremont, CA (US);

Jinwen Wang, Fremont, CA (US);

Ming Jiang, San Jose, CA (US);

Inventors:

Guanghong Luo, Fremont, CA (US);

Changqing Shi, San Ramon, CA (US);

Danning Yang, Fremont, CA (US);

Jinwen Wang, Fremont, CA (US);

Ming Jiang, San Jose, CA (US);

Assignee:

Western Digital (Fremont), LLC, Fremont, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B44C 1/22 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method and system for providing a pole of magnetic transducer having an intermediate layer are described. The method and system include providing a trench in the intermediate layer and depositing a nonmagnetic liner. A portion of the nonmagnetic liner resides in the trench. At least one seed layer is deposited. A portion of the at least one seed layer resides in the trench. The method and system include depositing at least one main pole layer. The at least one main pole layer is magnetic. A portion of the main pole layer(s) reside in the trench. The method and system also include performing a first chemical mechanical planarization (CMP). An excess portion of the seed layer(s) external to the trench are removed through an ion beam etch. The method and system further include performing a second CMP to remove an excess portion of the nonmagnetic liner external to the trench.


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