The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 11, 2012

Filed:

Mar. 05, 2010
Applicants:

Won-jae Moon, Seoul, KR;

Sang-oeb NA, Seoul, KR;

Hyung-young OH, Goyang-si, KR;

Yang-han Kim, Goyang-si, KR;

Young-sik Kim, Seoul, KR;

Kil-ho Kim, Suwon-si, KR;

Heui-joon Park, Incheon, KR;

Chang-hee Lee, Osan-si, KR;

Inventors:

Won-Jae Moon, Seoul, KR;

Sang-Oeb Na, Seoul, KR;

Hyung-Young Oh, Goyang-si, KR;

Yang-Han Kim, Goyang-si, KR;

Young-Sik Kim, Seoul, KR;

Kil-Ho Kim, Suwon-si, KR;

Heui-Joon Park, Incheon, KR;

Chang-Hee Lee, Osan-si, KR;

Assignee:

LG Chem Ltd., Seoul, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B24B 7/24 (2006.01); B24B 57/02 (2006.01);
U.S. Cl.
CPC ...
Abstract

A glass polishing system includes a lower unit capable of rotating a glass placed at a fixed position, an upper unit capable of contacting with the glass and being passively rotated due to the rotation of the glass, and a moving unit for moving the upper unit in a horizontal and/or vertical direction. The upper unit includes a platter installed to a spindle of the moving unit, a separative platter separatably installed to the platter and having a polishing pad contacting with the glass, and a vacuum chuck for fixing the separative platter with respect to the platter by means of vacuum.


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