The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 11, 2012
Filed:
Aug. 05, 2010
Hideaki Kutsuna, Tokyo, JP;
Hideaki Kutsuna, Tokyo, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
A mask of Y for a first pass is a mask in which a checker pattern having a high frequency characteristic is made to be the arrangement of the print permitting pixels, and a mask of C for the first pass is a mask in which a random image having a lower frequency characteristic is made to be the arrangement of the print permitting pixels. Further, each of the masks of Y and C for a second pass has an arrangement that mutually complements the arrangement of the print permitting pixels of the mask for the first pass. By using such masks, unevenness of the permeation speed caused by beading on a printing medium can be reduced. Further, high tolerance for interference to the mask of the prior pass and for influence of external disturbances can be achieved.