The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 11, 2012
Filed:
Dec. 15, 2010
Min Ho Kim, Daejeon, KR;
Ho Youl Jung, Daejeon, KR;
Jae Won Jang, Daejeon, KR;
SA Kwang Song, Daejeon, KR;
Soo Jun Park, Seoul, KR;
Min Ho Kim, Daejeon, KR;
Ho Youl Jung, Daejeon, KR;
Jae Won Jang, Daejeon, KR;
Sa Kwang Song, Daejeon, KR;
Soo Jun Park, Seoul, KR;
Electronics and Telecommunications Research Institute, Daejeon, KR;
Abstract
A method for analyzing a gait pattern includes: measuring, by a plurality of force sensing resistor (FSR) sensors, foot pressure values, and outputting the measured foot pressure values, respectively; searching for a maximum pressure local area in which the sum of the output values from the FSR sensors included in each of a plurality of pressure local areas is maximized; calculating a center of pressure (COP) with respect to the detected maximum pressure local area; and analyzing a gait pattern by adding the calculated COP to the trajectory of COPs.