The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 04, 2012
Filed:
Jan. 14, 2009
Applicant:
Mark Kalman, San Francisco, CA (US);
Inventor:
Mark Kalman, San Francisco, CA (US);
Assignee:
CISCO TECHNOLOGY, Inc., San Jose, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06K 9/40 (2006.01);
U.S. Cl.
CPC ...
Abstract
Embodiments of the invention provide a technique to sharpen luminance data associated with each pixel of a digital image without introducing certain sharpening artifacts. An alpha mask is generated based on first, second, and third alpha submasks that indicate how strongly overshoot, color fringe, and dark regions, respectively, are detected at each pixel location. The alpha mask is used to combine luminance data derived from the digital image with sharpened luminance data that is generated by applying a sharpening filter to the luminance data.