The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 04, 2012
Filed:
Jan. 22, 2008
Lisa Amini, Yorktown Heights, NY (US);
Brian Christopher Barker, Poughkeepsie, NY (US);
Perry G. Hartswick, Millbrook, NY (US);
Deepak S. Turaga, Nanuet, NY (US);
Olivier Verscheure, Hopewell Junction, NY (US);
Justin Wai-chow Wong, South Burlington, VT (US);
Lisa Amini, Yorktown Heights, NY (US);
Brian Christopher Barker, Poughkeepsie, NY (US);
Perry G. Hartswick, Millbrook, NY (US);
Deepak S. Turaga, Nanuet, NY (US);
Olivier Verscheure, Hopewell Junction, NY (US);
Justin Wai-chow Wong, South Burlington, VT (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A technique for identifying a defect in an object produced by a controllable process. A first type of data generated as a result of production of the object by the controllable process is obtained. A second type of data generated as a result of production of the object by the controllable process is obtained. The first type of data and the second type of data are jointly analyzed. A defect is identified in the object based on the joint analysis of the first type of data and the second type of data. By way of example, the controllable process comprises a semiconductor manufacturing process such as a silicon wafer manufacturing process and the object produced by the semiconductor manufacturing process comprises a processed wafer. The first type of data comprises tool trace data and the second type of data comprises wafer image data. The tool trace data is generated by a photolithographic tool.