The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 8259286 B1

PDF
Full Text
Expired
Date of Patent:
Sep. 04, 2012

Filed:

Dec. 21, 2005
Applicant:

Wojciech P. Maly, Pittsburgh, PA (US);

Inventor:

Wojciech P. Maly, Pittsburgh, PA (US);

Assignee:

Carnegie Mellon University, Pittsburgh, PA (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/42 (2006.01); G03B 27/54 (2006.01);
U.S. Cl.
CPC ...
Abstract

An apparatus for forming an energy pattern on a target, comprising a projector including a first row of spaced-apart energy outlets arranged in a first pattern, a second row of spaced apart energy outlets arranged in a second pattern, wherein the first pattern is different than the second pattern, and comprising a platform on which the target can be mounted, a motor and a controller. A method of forming a pattern in a layer of energy-sensitive material, comprising projecting a first energy pattern onto the energy-sensitive material, moving the first energy pattern relative to the layer of energy-sensitive material, projecting a second energy pattern onto the energy-sensitive material, wherein the second energy pattern is different than the first energy pattern, and moving the second energy pattern relative to the layer of energy-sensitive material.


Find Patent Forward Citations

Maly, Wojciech. (2012). Lithography and associated methods, devices, and systems (U.S. Patent No. 8259286). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8259286

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