The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 04, 2012
Filed:
Apr. 10, 2007
Applicants:
Daniel Gaebler, Ilmenau, DE;
Konrad Bach, Tiefthal, DE;
Inventors:
Daniel Gaebler, Ilmenau, DE;
Konrad Bach, Tiefthal, DE;
Assignee:
X-Fab Semiconductor Foundries AG, Erfurt, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 31/062 (2012.01);
U.S. Cl.
CPC ...
Abstract
The invention relates to processes for the production and elements (components) with a nanostructure () for improving the optical behavior of components and devices and/or for improving the behavior of sensors by enlarging the active surface area. The nanostructure () is produced in a self-masking fashion by means of RIE etching and its material composition can be modified and it can be provided with suitable cover layers.