The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 04, 2012

Filed:

Aug. 08, 2006
Applicants:

Roert E. Walters, Webster, NY (US);

William S. Dipoala, Fairport, NY (US);

Inventors:

Roert E. Walters, Webster, NY (US);

William S. DiPoala, Fairport, NY (US);

Assignee:

Robert Bosch GmbH, Stuttgart, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01J 5/02 (2006.01);
U.S. Cl.
CPC ...
Abstract

An apparatus for enabling and disabling a lookdown zone mask in an intrusion detector unit. The unit may include a passive infrared motion detector, a lens assembly, and a mask or cover which selectively enables and disables a lookdown zone associated with the detector. The lens assembly provides a lens proximate the detector. The lens provides the lookdown zone. When the mask substantially covers the lens, the lookdown zone is disabled because the path of radiant energy to the detector is blocked and prevents the detector from detecting any motion in the lookdown zone. When the mask does not cover the lens, the lookdown zone is enabled because the lens permits the path of radiant energy to the detector through the lens and allows the detector to detect any motion in the lookdown zone.


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