The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 04, 2012
Filed:
Mar. 12, 2008
Joachim P. Spatz, Stuttgart, DE;
Theobald Lohmueller, Nuremberg, DE;
Marco Arnold, Gaiberg, DE;
Abstract
A method for creating extensive variations in size or distance in nanostructure patterns on surfaces preferably includes: a) contacting a substrate with a liquid phase containing organic two-block or multi-block copolymer micelles, which are charged with an inorganic metal compound, by immersion into this liquid phase, during which chemically different polymer domains including inorganic metal compounds enclosed in micelles are deposited on the substrate; b) withdrawing the substrate from the liquid phase at a predetermined withdrawing speed, which is varied continuously or gradually, so that a gradient of the lateral separation length of the polymer domains is produced on the substrate surface; c) converting the deposited inorganic metal compounds by an oxidation- or reduction treatment into inorganic nanoparticles and optionally complete or partial removal of the organic polymer by a plasma treatment, wherein positions and lateral separation length of the nanoparticles obtained are determined by those of deposited polymer domains.