The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 04, 2012
Filed:
Mar. 03, 2010
Lijie Guan, San Jose, CA (US);
Changqing Shi, San Ramon, CA (US);
Ming Jiang, San Jose, CA (US);
Yun-fei LI, Fremont, CA (US);
Lijie Guan, San Jose, CA (US);
Changqing Shi, San Ramon, CA (US);
Ming Jiang, San Jose, CA (US);
Yun-Fei Li, Fremont, CA (US);
Western Digital (Fremont), LLC, Fremont, CA (US);
Abstract
Methods of forming a write pole are disclosed. A first photomask having a first opening over one of a yoke region and a pole tip region of the write pole is formed over an insulation layer having an insulator material. A first etch process is performed on the insulation layer via the first opening, the first etch process removing the insulator material from a corresponding one of the yoke region and the pole tip region. A second photomask having a second opening over the other one of the yoke region and the pole tip region is formed over the insulation layer. A second etch process is performed on the insulation layer via the second opening, the second etch process removing the insulator material from a corresponding one of the yoke region and the pole tip region.