The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 28, 2012

Filed:

Jul. 26, 2007
Applicants:

Mark Alexander Abourizk, Boronia Park, AU;

Paul Anthony Green, Lindfield, AU;

Robert Edward Henry, Roseville, AU;

Karthikeyan Selvarajan, Gosford, AU;

Joanne Elizabeth Drew, Balgowiah Heights, AU;

Inventors:

Mark Alexander Abourizk, Boronia Park, AU;

Paul Anthony Green, Lindfield, AU;

Robert Edward Henry, Roseville, AU;

Karthikeyan Selvarajan, Gosford, AU;

Joanne Elizabeth Drew, Balgowiah Heights, AU;

Assignee:

ResMed Limited, Bella Vista, AU;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06K 9/00 (2006.01); G01B 11/24 (2006.01);
U.S. Cl.
CPC ...
Abstract

Systems and methods for selecting a mask system for a patient are provided. Certain example embodiments include generating 3D contours of patients and selecting mask systems based at least on these contours. These contours may be generated by using, for example, a cushion of translatable pins, a nasal cannular scanning device, and/or a shadow stereopsis sensor. Certain other example embodiments allow images and/or videos to be captured and optionally synchronized. Then, images of various mask systems may be overlaid to determine how well a mask system fits. In still other embodiments, a user can hold a transparency corresponding to a mask design in front of the patient's face to determine how well a mask system fits.


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