The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 28, 2012
Filed:
Dec. 09, 2009
Jeroen Jonkers, Aachen, DE;
Felix A. Kuepper, Viersen, DE;
Harald E. Verbraak, Maastricht, NL;
Jakob W. Neff, Kelmis, BE;
Jeroen Jonkers, Aachen, DE;
Felix A. Kuepper, Viersen, DE;
Harald E. Verbraak, Maastricht, NL;
Jakob W. Neff, Kelmis, BE;
Koninklijke Philips Electronics N.V., Eindhoven, NL;
Abstract
The present invention relates to a method and device for generating optical radiation, in particular EUV radiation or soft x-rays, by means of an electrically operated discharge. A plasma () is ignited in a gaseous medium between at least two electrodes (), wherein said gaseous medium is produced at least partly from a liquid material () which is applied to one or several surface(s) moving in the discharge space and is at least partially evaporated by one or several pulsed energy beams. In the proposed method and device at least two consecutive pulses () are applied within a time interval of each electrical discharge onto said surface(s). With this measure, the collectable conversion efficiency is increased compared to the use of only one single energy pulse within each electrical discharge.