The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 28, 2012

Filed:

Nov. 18, 2008
Applicants:

Se-won Lee, Chungcheongnam-do, KR;

Jae-jeong Jeong, Chungcheongnam-do, KR;

Jung-gun Cho, Seoul, KR;

Inventors:

Se-Won Lee, Chungcheongnam-do, KR;

Jae-Jeong Jeong, Chungcheongnam-do, KR;

Jung-Gun Cho, Seoul, KR;

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
B23K 26/00 (2006.01); B23K 26/02 (2006.01);
U.S. Cl.
CPC ...
Abstract

A substrate cleaning apparatus includes a supporting plate supporting a substrate and a shielding unit that is disposed above the substrate to protect the substrate. A portion of the shielding unit, which is adjacent to a focal point where light for generating shock waves is focused, is switched. Therefore, the substrate cleaning apparatus prevents the concentration of plumes and residence beams, which are generated together with the shock waves, on a specific region of the shielding unit and further prevents the recontamination of the substrate by the damage of the shielding unit.


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